Search Results - lithography

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Programmable Soft Lithography: Solvent-Assisted Nanoscale Embossing
NU 2010-046 Inventors Mark Huntington Min Hyung Lee Teri Odom* Wei Zhou Abstract Molding at the nanoscale has driven the production of high-density optical and magnetic storage media, organic light-emitting diodes, polymer photovoltaic cells, and field-effect transistors. While rigid molds may be used to imprint soft and semi-hard materials...
Published: 7/3/2024   |   Inventor(s):  
Keywords(s): Lithography, Materials, Nanotechnology
Category(s): Physical Sciences > Materials and Industrial Processes
2007-405 Massively Parallel Assembly of Composite Structures using Depletion Attractions
Summary: Scientists in the Department of Chemistry and Biochemistry at UCLA have identified a way to selectively order and assemble solid microcomponents dispersed in liquids into larger composite devices using attractive interactions that are geometry-dependent. This technique enables the systematic parallel fabrication of complex microstructures...
Published: 7/19/2023   |   Inventor(s): Thomas Mason
Keywords(s): Composite Material, Composite Materials, Lithography, Manufacturing, MEMS, Microelectronics, Microelectronics Semiconductor Device Fabrication, Nanotechnology
Category(s): Materials > Composite Materials, Materials, Materials > Nanotechnology, Mechanical, Electrical > Mems
Continuous Stereolithography 3D Fabrication Without Scaffolding
Uses Liquid Interface for High Performance Printing of Large-Scale and Ultra-High-Aspect FeaturesBy employing a transparent inert liquid as the constraining surface, this stereolithography 3D printing system can fabricate even large-scale and ultra-high-aspect features continuously without a need for scaffolding or support. Stereolithography uses photopolymerization...
Published: 6/27/2021   |   Inventor(s): Toshikazu Nishida, Aftab Bhanvadia
Keywords(s): 3D printing, additive manufacturing, Continuous liquid interphase printing, dlp, Free radical polymerization, Lithography, Microstereolithography, Oxygen inhibition, photopolymerization, Photopolymerization inhibition, stereolithography, stiction
Category(s): Technology Classifications > Engineering > Electrical, Technology Classifications > Engineering > Materials
High-Throughput Imaging of Graphene Based Sheets by Fluorescence Quenching Microscopy
NU 2009-099InventorsLaura CoteJiaxing Huang*Franklin KimJaemyung KimShort DescriptionMethod for visualizing graphene without special substrates Abstract Graphene based sheets have stimulated great interest due to their superior mechanical, electrical and thermal properties. A general visualization method has been developed that allows quick observation...
Published: 7/3/2024   |   Inventor(s):  
Keywords(s): Graphene, Lithography, Materials, Microscopy
Category(s): Physical Sciences > Materials and Industrial Processes
Additive Manufacturing of Inverse-Designed Devices Control Electromagnetic Radiation
NU 2017-060 Inventors Alan Sahakian* Koray Aydin Francois Calleaert Short Description A platform that combines an inverse electromagnetic design computational method with additive manufacturing to design and fabricate all-dielectric metadevices. Background Building miniature optical devices is desirable for creating ultra sensing devices with excellent...
Published: 7/3/2024   |   Inventor(s):  
Keywords(s): Engineering, Instrumentation, Lithography, Manufacturing/Processing, Thin film
Category(s): Physical Sciences > Engineering & Technology
A Novel Heterostructure of MoS2 shell-encapsulated Au Nanoparticle for Enhanced Optics and Optoelectronics
NU 2016-078 InventorsVinayak Dravid* Yuan Li Xinqi Chen Short DescriptionA modified chemical vapor deposition technique that directly encapsulates MoS2 on gold nanoparticles as novel heterostructuresAbstractMolybdenum disulfide (MoS2)/Gold (Au) hybrid structures have recently been gaining much attention for optimizing the performance of MoS2 in electronic...
Published: 7/3/2024   |   Inventor(s):  
Keywords(s): Electronics & Circuits, Energy and Infrastructure, Engineering, Lithography, Manufacturing/Processing, Materials, Nanotechnology, Sensors
Category(s): Physical Sciences > Engineering & Technology, Physical Sciences > Materials and Industrial Processes
Repurposing Blu-Ray Movie Discs As Low-Cost Templates For Photon Management
NU 2014-130 InventorsJiaxing Huang*Cheng SunChen WangAlexander Smith Short DescriptionA novel solar cell manufacturing process using repurposed Blu-ray discs AbstractNorthwestern researchers have developed a novel purpose for Blu-Ray Discs - photon management. Efficient absorption of light in solar cells or light emitting diodes (LEDs) is crucial for...
Published: 7/3/2024   |   Inventor(s):  
Keywords(s): Computer hardware, Electronics & Circuits, Engineering, Lithography, Manufacturing/Processing, Nanotechnology
Category(s): Physical Sciences > Engineering & Technology
A Low-Cost, "Maskless" Photolithography Method
NU 2008-079InventorsHooman MohseniShort DescriptionA low-cost, "maskless" photolithography method to produce highly uniform arrays of nanopillars and nanoholes over a large area. AbstractThe invention uses a self-assembled, ordered monolayer of hexagonally close packed (HCP) micro-spheres as optical lenses to generate deep sub-wavelength regular...
Published: 7/3/2024   |   Inventor(s):  
Keywords(s): Energy and Infrastructure, Lithography, Manufacturing/Processing, Materials, Nanotechnology
Category(s): Physical Sciences > Materials and Industrial Processes
Two-Photon Laser Lithography for Fabrication of XFEL Sample Injectors
X-ray Free Electron Lasers (XFEL) are a valuable tool for determining the structure of biological macromolecules. Obtaining accurate results necessitates solvation of the sample in a specified chemical solution throughout the injection process. This solvation must not unduly compromise the vacuum environment or cleanliness of the XFEL scattering chamber....
Published: 2/23/2023   |   Inventor(s): R. Bruce Doak, Garrett Nelson
Keywords(s): Bioanalysis, Liquid Handling and Dispensing, Lithography, Micro-Fluidics, Nanostructure, Protein Assays
Category(s): Advanced Materials/Nanotechnology, Applied Technologies, Imaging, Physical Science, Physics
HLA Exposure Tool
Researchers at the University of Arizona have developed an interferometer that operates at 121.6 nm, wherein the sample is outside the vacuum and only the source itself is enclosed in a vacuum. This allows the instrument to be used in lithography without the need to create a large vacuum chamber to hold the sample and instrument during writing or...
Published: 4/3/2023   |   Inventor(s): Thomas Milster, Thiago Jota
Keywords(s): Hydrogen Lyman Alpha (HLA), lithography
Category(s): Technology Classifications > Imaging & Optics, Technology Classifications > Imaging & Optics > Microscopy, Spectroscopy, Polarimetry