Search Results - robert+brainard

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Positive-Tone Metal-Containing EUV Resists
A novel platform of positive-tone metal-containing resists for use in EUV lithography. Background: Positive-tone resists are required for the most demanding features in the fabrication of integrated circuits such as etching a “contact hole.” One challenge in the design of metal containing resists is the scarcity of resists that exhibit...
Published: 8/5/2025   |   Inventor(s): Robert Brainard, Jordan Greenough
Keywords(s): Technologies
Category(s): Campus > SUNY Polytechnic Institute
Alkynyl Ligands for Metal-Containing EUV Resists
This technology is a method for producing metal-containing resists for EUV lithography that provide cleaner toes and higher contrast. Background: A photoresist is a type of photosensitive material that undergoes chemical change when exposed to light. They are widely used in the manufacture of microcircuits. One type of photoresist reacts to extreme...
Published: 5/13/2025   |   Inventor(s): Robert Brainard, Munsaf Ali
Keywords(s): EUV, EUV photoresists, lithography, photoresists, Technologies
Category(s): Campus > SUNY Polytechnic Institute
Chain-Scission Polyester PAG-Polymers Disclosure IV
A high-performance photoresist that improves extreme ultraviolet image resolution, line width roughness, and sensitivity. Background: Extreme ultraviolet (EUV) imaging is an optical technology that enables smaller feature sizes in semiconductor chips, which pushes device performance forward. It works by first producing a pattern by exposing a reflective...
Published: 5/13/2025   |   Inventor(s): Robert Brainard
Keywords(s): Technologies
Category(s): Campus > SUNY Polytechnic Institute, Technology Classifications > Electronics, Technology Classifications > Energy, Technology Classifications > Imaging, Technology Classifications > Materials and Chemicals, Technology Classifications > Optics and Photonics
Acid Amplifiers for EUV Photoresists
An acid amplifier system that improves the capabilities of extreme ultraviolet imaging (13.5 nm) and electron-beam lithography. Background: Extreme ultraviolet (EUV) imaging is an optical technology that enables smaller feature sizes in semiconductor chips, which pushes device performance forward. It works by first producing a pattern by exposing...
Published: 5/13/2025   |   Inventor(s): Robert Brainard
Keywords(s): Technologies
Category(s): Campus > SUNY Polytechnic Institute, Technology Classifications > Electronics, Technology Classifications > Imaging, Technology Classifications > Engineering, Technology Classifications > Materials and Chemicals, Technology Classifications > Optics and Photonics