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Search Results - photoresists
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Alkynyl Ligands for Metal-Containing EUV Resists
This technology is a method for producing metal-containing resists for EUV lithography that provide cleaner toes and higher contrast. Background: A photoresist is a type of photosensitive material that undergoes chemical change when exposed to light. They are widely used in the manufacture of microcircuits. One type of photoresist reacts to extreme...
Published: 5/13/2025
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Inventor(s):
Robert Brainard
,
Munsaf Ali
Keywords(s):
EUV
,
EUV
photoresists
,
lithography
,
photoresists
,
Technologies
Category(s):
Campus > SUNY Polytechnic Institute