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Integration of III-V Laser and III-V Material into Silicon Photonics Technology
This technology integrates CMOS standard manufacturing processes and Silicon (Si) substrates with direct epitaxial growth of III-V lasers, to improve manufacturing throughput, reduce costs, and produce high-performance, compact photonic integrated circuits (PICs). Background: Photonic integrated circuits (PICs) are chips designed to manipulate light...
Published: 2/26/2026   |   Inventor(s): William Charles, Douglas Coolbaugh, Gerald Leake, Douglas La Tulipe, John Bowers
Keywords(s):  
Category(s): Campus > NY CREATES, Campus > SUNY Polytechnic Institute, Technology Classifications > Optics and Photonics
Enhanced Fluorophore Discrimination in Fluorescence Microscopy Using Multi View Spectral Unmixing with Photobleaching Dynamics
This technology allows researchers to more easily distinguish hundreds of fluorescent labels in a single image, useful for a wide variety of biological applications. Background: There are hundreds to thousands of different cells or other structures that can be labeled with fluorescent reporters in a biological sample, and then imaged on a fluorescence...
Published: 1/29/2026   |   Inventor(s): Alex Valm, Yunlong Feng, Ruogu Wang
Keywords(s): Technologies
Category(s): Campus > University at Albany, Technology Classifications > Biomedical Science and Engineering, Technology Classifications > Bioinformatics, Technology Classifications > Artificial Intelligence, Technology Classifications > Imaging, Technology Classifications > Optics and Photonics, Technology Classifications > Research Tools and Reagents, Technology Classifications > Screens and Assays, Technology Classifications > Healthcare, Technology Classifications > Diagnostics, Technology Classifications > Dental
A Method for Fabrication of Optical Waveguides of Excellent Thermal Stability in Single-Crystal Sapphire Wafer and Fibers
A novel method for producing sapphire optics suitable for sensing parameters in harsh-environment fabrication processes. Background: Single-crystal sapphire optics offer a promising method for sensing physical data in harsh-environment manufacturing processes. Unfortunately, the use of this technology has been limited due to lack of a thermally stable...
Published: 1/29/2026   |   Inventor(s): Mengbing Huang, William Spratt
Keywords(s):  
Category(s): Campus > SUNY Polytechnic Institute, Technology Classifications > Optics and Photonics
Reconfigurable RF/Digital Hybrid 3D Interconnect
­A novel interconnect technology that enables system designers to take better advantage of increased IC power while satisfying energy consumption and space limitations. Background: As the semiconductor industry develops technologies on the nano-scale, interconnect latency is increasing. This places serious limitations on designs, as the input/output...
Published: 1/29/2026   |   Inventor(s): Robert Geer, Wei Wang, Tong Jing
Keywords(s): Technologies
Category(s): Campus > SUNY Polytechnic Institute, Technology Classifications > Biomedical Science and Engineering, Technology Classifications > Imaging, Technology Classifications > Medical Imaging, Technology Classifications > Optics and Photonics, Technology Classifications > Research Tools and Reagents
Chain-Scission Polyester PAG-Polymers Disclosure IV
A high-performance photoresist that improves extreme ultraviolet image resolution, line width roughness, and sensitivity. Background: Extreme ultraviolet (EUV) imaging is an optical technology that enables smaller feature sizes in semiconductor chips, which pushes device performance forward. It works by first producing a pattern by exposing a reflective...
Published: 1/30/2026   |   Inventor(s): Robert Brainard
Keywords(s): Technologies
Category(s): Campus > SUNY Polytechnic Institute, Technology Classifications > Electronics, Technology Classifications > Energy, Technology Classifications > Imaging, Technology Classifications > Materials and Chemicals, Technology Classifications > Optics and Photonics
Acid Amplifiers for EUV Photoresists
An acid amplifier system that improves the capabilities of extreme ultraviolet imaging (13.5 nm) and electron-beam lithography. Background: Extreme ultraviolet (EUV) imaging is an optical technology that enables smaller feature sizes in semiconductor chips, which pushes device performance forward. It works by first producing a pattern by exposing...
Published: 1/30/2026   |   Inventor(s): Robert Brainard
Keywords(s): Technologies
Category(s): Campus > SUNY Polytechnic Institute, Technology Classifications > Electronics, Technology Classifications > Imaging, Technology Classifications > Engineering, Technology Classifications > Materials and Chemicals, Technology Classifications > Optics and Photonics
Optoelectronic Devices Based on Thin Single-Crystalline Semiconductor Films and Non-Epitaxial Optical Cavities
A novel nanoscale optoelectronic device comprising ultrathin materials with single-crystalline quality providing a strong light-matter interaction with high photon absorption and quantum efficiency. Background: Miniaturization of optoelectronic devices offers tremendous performance gain. As the volume of photoactive material decreases, optoelectronic...
Published: 2/19/2026   |   Inventor(s): Qiaoqiang Gan, Haomin Song, Zhenqiang Ma, Zhenyang Xia, Zongfu Yu, Ming Zhou
Keywords(s): Technologies
Category(s): Technology Classifications > Electronics, Technology Classifications > Optics and Photonics, Technology Classifications > Energy, Campus > University at Buffalo