Search Results - technology+classifications+%3e+optics+and+photonics

9 Results

Sort By:

Integration of III-V Laser and III-V Material into Silicon Photonics Technology

This technology integrates CMOS standard manufacturing processes and Silicon (Si) substrates with direct epitaxial growth of III-V lasers, to improve manufacturing throughput, reduce costs, and produce high-performance, compact photonic integrated circuits (PICs). Background: Photonic integrated circuits (PICs) are chips designed to manipulate light...

Published: 3/25/2026 | Updated: 2/26/2026 | Inventor(s): William Charles, Douglas Coolbaugh, Gerald Leake, Douglas La Tulipe, John Bowers

Keywords(s):

Category(s): Campus > NY CREATES, Technology Classifications > Optics and Photonics

Enhanced Fluorophore Discrimination in Fluorescence Microscopy Using Multi View Spectral Unmixing with Photobleaching Dynamics

This technology allows researchers to more easily distinguish hundreds of fluorescent labels in a single image, useful for a wide variety of biological applications. Background: There are hundreds to thousands of different cells or other structures that can be labeled with fluorescent reporters in a biological sample, and then imaged on a fluorescence...

Published: 3/26/2026 | Updated: 10/24/2025 | Inventor(s): Alex Valm, Yunlong Feng, Ruogu Wang

Keywords(s): fluorescence, fluoroscopy, Technologies

Positive-Tone Metal-Containing EUV Resists

A novel platform of positive-tone metal-containing resists for use in EUV lithography. Background: Positive-tone resists are required for the most demanding features in the fabrication of integrated circuits such as etching a “contact hole.” One challenge in the design of metal containing resists is the scarcity of resists that exhibit...

Published: 3/24/2026 | Updated: 8/5/2025 | Inventor(s): Robert Brainard, Jordan Greenough

Keywords(s): Technologies

Category(s): Campus > University at Albany, Technology Classifications > Optics and Photonics

Alkynyl Ligands for Metal-Containing EUV Resists

This technology is a method for producing metal-containing resists for EUV lithography that provide cleaner toes and higher contrast. Background: A photoresist is a type of photosensitive material that undergoes chemical change when exposed to light. They are widely used in the manufacture of microcircuits. One type of photoresist reacts to extreme...

Published: 3/24/2026 | Updated: 5/13/2025 | Inventor(s): Robert Brainard, Munsaf Ali

Keywords(s): EUV, EUV photoresists, lithography, photoresists, Technologies

Category(s): Technology Classifications > Optics and Photonics, Campus > University at Albany

A Method for Fabrication of Optical Waveguides of Excellent Thermal Stability in Single-Crystal Sapphire Wafer and Fibers

A novel method for producing sapphire optics suitable for sensing parameters in harsh-environment fabrication processes. Background: Single-crystal sapphire optics offer a promising method for sensing physical data in harsh-environment manufacturing processes. Unfortunately, the use of this technology has been limited due to lack of a thermally stable...

Published: 3/20/2026 | Updated: 5/13/2025 | Inventor(s): Mengbing Huang, William Spratt

Keywords(s):

Category(s): Technology Classifications > Optics and Photonics, Campus > University at Albany

Reconfigurable RF/Digital Hybrid 3D Interconnect

A novel interconnect technology that enables system designers to take better advantage of increased IC power while satisfying energy consumption and space limitations. Background: As the semiconductor industry develops technologies on the nano-scale, interconnect latency is increasing. This places serious limitations on designs, as the input/output...

Published: 3/24/2026 | Updated: 5/13/2025 | Inventor(s): Robert Geer, Wei Wang, Tong Jing

Keywords(s): Technologies

Category(s): Technology Classifications > Biomedical Science and Engineering, Technology Classifications > Imaging, Technology Classifications > Medical Imaging, Technology Classifications > Optics and Photonics, Technology Classifications > Research Tools and Reagents, Campus > University at Albany

Chain-Scission Polyester PAG-Polymers Disclosure IV

A high-performance photoresist that improves extreme ultraviolet image resolution, line width roughness, and sensitivity. Background: Extreme ultraviolet (EUV) imaging is an optical technology that enables smaller feature sizes in semiconductor chips, which pushes device performance forward. It works by first producing a pattern by exposing a reflective...

Published: 3/24/2026 | Updated: 5/13/2025 | Inventor(s): Robert Brainard

Keywords(s): Technologies

Category(s): Technology Classifications > Electronics, Technology Classifications > Energy, Technology Classifications > Imaging, Technology Classifications > Materials and Chemicals, Technology Classifications > Optics and Photonics, Campus > University at Albany

Acid Amplifiers for EUV Photoresists

An acid amplifier system that improves the capabilities of extreme ultraviolet imaging (13.5 nm) and electron-beam lithography. Background: Extreme ultraviolet (EUV) imaging is an optical technology that enables smaller feature sizes in semiconductor chips, which pushes device performance forward. It works by first producing a pattern by exposing...

Published: 3/24/2026 | Updated: 5/13/2025 | Inventor(s): Robert Brainard

Keywords(s): Technologies

Category(s): Technology Classifications > Electronics, Technology Classifications > Imaging, Technology Classifications > Engineering, Technology Classifications > Materials and Chemicals, Technology Classifications > Optics and Photonics, Campus > University at Albany

Optoelectronic Devices Based on Thin Single-Crystalline Semiconductor Films and Non-Epitaxial Optical Cavities

A novel nanoscale optoelectronic device comprising ultrathin materials with single-crystalline quality providing a strong light-matter interaction with high photon absorption and quantum efficiency. Background: Miniaturization of optoelectronic devices offers tremendous performance gain. As the volume of photoactive material decreases, optoelectronic...

Published: 4/16/2026 | Updated: 1/18/2018 | Inventor(s): Qiaoqiang Gan, Haomin Song, Zhenqiang Ma, Zhenyang Xia, Zongfu Yu, Ming Zhou

Keywords(s): Technologies

Category(s): Technology Classifications > Electronics, Technology Classifications > Optics and Photonics, Technology Classifications > Energy, Campus > University at Buffalo