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A Simple, Robust Route for Generating Unidirectionally Aligned, Nanoscopic Line Patterns of Block Copolymers over Arbitrarily Large Areas

Researchers at UMass Amherst, UC Berkeley and Ulsan National Institute of Science and Technology have collaboratively developed a simple, robust route for producing unidirectionally aligned, nanoscopic line patterns of block copolymers over arbitrarily large areas, with an order parameter in excess of 0.97. The fabrication process combines the “bottom-up,”...

Published: 8/10/2023 | Inventor(s): Thomas Russell, Sung Woo Hong, Dong-Hyun Lee, Soojin Park, Ting Xu

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Category(s): Nanotechnology, Material science, Computers, Devices, Engineering, Electronics, Physical Science