Search Results - kathleen+dunn

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Improved Chemical-Mechanical Polishing Slurry Composition and Method to Improve Polishing of Metals and Non-metals Using Cerium Oxide Nanoparticles
Reducing manufacturing time, cost, and labor by employing chemistry to transform a two-step process into an easily controlled single-step. Background: Integrated circuits are built of many layers. Each layer must be perfectly flat so that connections line up between layers and electricity flows properly throughout. Conventional CMP systems consist...
Published: 9/20/2024   |   Inventor(s): Christopher Netzband, Kathleen Dunn
Keywords(s): abrasive, cerium, cerium oxide, chemical activity, chemical mechanical polishing, CMP, CMP slurries, dielectrics, fiber optics, integrated circuit, lens, mechanical polish, metallic surface, optics, polish, polishing, semiconductor wafers, semiconductors, slurry, surface finishing, surface quality
Category(s): Campus > SUNY Polytechnic Institute, Technology Classifications > Materials and Chemicals, Technology Classifications > Nanotechnology
Modified Green Tea Polyphenol EGCG and EGCG-ester Inhibit Endospores
Modified Green Tea Polyphenol EGCG and EGCG-ester Inhibit EndosporesResearchers at Augusta University have invented skin-friendly compositions and methods for killing, inactivating, or otherwise reducing the bacterial endospores by using an effective amount of the green tea EGCG or its derivatives. EGCG research shows clear application for a hand sanitizer...
Published: 4/21/2023   |   Inventor(s): Stephen Hsu, Lee Lee, Tin-Chun Chu
Keywords(s):  
Category(s): Therapeutics