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Search Results - gregory+denbeaux
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Resist Enhancements for Sensitivity and Resolution
Photoresist layer manufacturing for use in a semiconductor component using a generated electric field. Background: Due to the unique properties of semiconductors, their use in modern computing/electronic technologies has found wide use in IC, diodes, LED, rectifiers, MOSFET, transistors, solar cells, and other computing materials. Semiconductor fabrication...
Published: 9/17/2024
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Inventor(s):
Gregory Denbeaux
Keywords(s):
material science
,
materials and chemicals
,
semiconductors
,
Technologies
Category(s):
Technology Classifications > Materials and Chemicals
,
Campus > SUNY Polytechnic Institute
Molten Liquid Nanodroplet Vacuum Impaction for Additive Manufacturing
An efficient, high purity material additive manufacturing technique designed to reduce material waste and energy consumption. Background: The additive manufacturing market has an existing need for a high purity material additive manufacturing process with reduced energy usage. Additive manufacturing uses data computer aided design (CAD) software...
Published: 12/20/2023
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Inventor(s):
Gregory Denbeaux
Keywords(s):
material science
,
semiconductors
Category(s):
Technology Classifications > Materials and Chemicals
,
Campus > SUNY Polytechnic Institute