Technology Overview: Soft lithography uses a patterned elastomer polydimethylsiloxane (PDMS) as the stamp or mold to generate micro- and nano-patterns. This method is limited for features smaller than 100 nm, as the low modulus PDMS may deform and result in pattern collapse and rounded corners. Penn scientists have developed a novel method to form sub-100nm features on nano-patterned thin films of PDMS that takes advantage of the ability of PDMS to be distorted by solvents, mechanical forces, and heat in a controlled and predictable fashion.
Intellectual Property: US 8,557,341
Reference Media: Y. Zhang et al., Nano Lett 2008 8(4): 1192
Docket # T4500