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Long Range Ordered Semiconductor Interface Phase and Oxides
In the manufacture of semiconductor devices, the substrate, usually Silicon, is oxidized to form an oxide layer at the surface prior to device fabrication. This oxide layer (such as SiO2 grown on a Si (100)) surface typically grows completely amorphous with little ordering in the first atomic layers near the interface. This can lead to thickness and...
Published: 2/23/2023   |   Inventor(s): Nicole Herbots, Vasudeva Atluri, Jiong Xiang, James Bradley, Swati Banerjee, Quinton Hurst
Keywords(s): Processing, Semiconductor Processing
Category(s): Physical Science, Semiconductors, Materials & Processes