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Tuning Characteristics of Films formed by Atomic Layer Deposition Through Underlayer Modification
Tuning Characteristics of Films formed by Atomic Layer Deposition Through Underlayer Modification Background: The field of thin film deposition, particularly using atomic layer deposition (ALD), is critical for the fabrication of advanced electronic and quantum devices. Tantalum nitride (TaN) thin films are widely used as diffusion barriers, etch-stop...
Published: 1/6/2026
|
Inventor(s):
Hunter Frost
,
Christopher Borst
,
Ekta Bhatia
,
Tuan Vo
,
Soumen Kar
,
Satyavolu Papa Rao
Keywords(s):
CMOS interconnects
,
Quantum computing
,
single flux quantum logic
,
Technologies
Category(s):
Campus > NY CREATES
,
Campus > SUNY Polytechnic Institute
,
Technology Classifications > Quantum Computing