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Selective Deposition of Ruthenium Films by Digital Chemical Vapor Deposition
Recently, efforts have been made to obtain larger capacitance values in capacitors of semiconductor devices using noble metals such as ruthenium (Ru), platinum (Pt), iridium (Ir), and osmium (Os) as a lower electrode or an upper electrode of a capacitor. Chemical vapor deposition (CVD) is often used to deposit this metal over the entire wafer surface....
Published: 2/23/2023   |   Inventor(s): Sandwip Dey, Jaydeb Goswami
Keywords(s): Processing
Category(s): Physical Science, Semiconductors, Materials & Processes