Sub-5 nm Full Pitch Lamellar Microdomains by Chemical Transformation

PRODUCT OPPORTUNITIES

• Nanolithographic templates for nanoelectronics, storage media and separation media

PRODUCT OPPORTUNITIES

COMPETITIVE ADVANTAGES

• Smallest lamellar microdomains ever been achieved with block copolymers
• Simple process without the use of any additives for the solid state conversion of block copolymers from a disordered material to a microphase separated material
• Enabling the generation of ultra-high-resolution lithographic templates

TECHNOLOGY DESCRIPTION

This invention provides a simple method of fabricating microphase separated block copolymer thin films with ordered, sub-5 down to sub-3 nm full pitch lamellar microdomains. The method involves the use of acid vapor hydrolysis to convert two hydrophobic blocks of a block copolymer into one hydrophilic block and one hydrophobic block, resulting in self-assembly of the copolymer and its transformation in the solid state into microphase separated and ordered lamellar microdomain.

ABOUT THE INVENTOR

Dr. Thomas P. Russell is the Silvio O. Conte Distinguished Professor of Polymer Science and Engineering at the University of Massachusetts Amherst, and a member of the National Academy of Engineering.

AVAILABILITY:

Available for Licensing and/or Sponsored Research

DOCKET:

UMA 18-015

PATENT STATUS:

Patent Issued

NON-CONFIDENTIAL INVENTION DISCLOSURE

LEAD INVENTOR:

Thomas P. Russell, Ph.D.

CONTACT:

This invention provides a simple method of fabricating microphase separated block copolymer thin films with ordered, sub-5 down to sub-3 nm full pitch lamellar microdomains. The method involves the use of acid vapor hydrolysis to convert two hydrophobic blocks of a block copolymer into one hydrophilic block and one hydrophobic block, resulting in self-assembly of the copolymer and its transformation in the solid state into microphase separated and ordered lamellar microdomain.