This technology enables the creation of advanced optical elements through thin film coatings. By spatially varying the thickness, order, and material composition of thin film stacks, the technology allows for precise control of light's phase and amplitude. It is particularly advantageous in the extreme ultraviolet (EUV) wavelength range, where traditional optical systems struggle. This approach facilitates the design and fabrication of metasurfaces, metalenses, and other high-efficiency optical components, opening up new possibilities for EUV applications in lithography, imaging, and microscopy. Background: Developing optical elements for EUV applications is highly challenging due to material limitations and fabrication complexities. Current solutions, such as metasurfaces or diffractive optical elements, often suffer from low efficiency or limited phase control. This invention addresses these issues by using customizable thin film coatings that enable precise and continuous phase and amplitude control, offering a scalable and efficient alternative to traditional methods. By enabling fine control over optical properties without relying on bulky components, this method facilitates the development of next-generation optical systems for applications such as EUV lithography, microscopy, and high-resolution imaging. Applications:
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