Nanopatterned Articles Produced Using Reconstructed Block Copolymer Films

PRODUCT OPPORTUNITIES

• Templates or masks for pattern transfer into silicon substrates
• Templates for metal evaporation

PRODUCT OPPORTUNITIES

COMPETITIVE ADVANTAGES

• Efficient, economical and environment-friendly fabrication process that is independent of substrates
• Highly oriented microdomains with long-range lateral order
• Enabling pattern transfer to the underlying substrate to form nanostructures with a high aspect ratio

TECHNOLOGY DESCRIPTION

This invention provides metal coated nanoporous block copolymer templates and related methods that can be used to fabricate different types of metal masks suitable for pattern transfer into silicon substrates or as templates for metal evaporation to form arrays of nanorings.

ABOUT THE INVENTOR

Dr. Thomas P. Russell is the Silvio O. Conte Distinguished Professor of Polymer Science and Engineering at the University of Massachusetts Amherst. He is a member of the National Academy of Engineering and National Academy of Inventors Fellow.

AVAILABILITY:

Available for Licensing and/or Sponsored Research

DOCKET:

UMA 09-08

PATENT STATUS:

US Patents Issued: US 8,518,837, US 9,358,750 and US 9,636,887

NON-CONFIDENTIAL INVENTION DISCLOSURE

LEAD INVENTOR:

Thomas P. Russell, Ph.D.

CONTACT:

This invention provides metal coated nanoporous block copolymer templates and related methods that can be used to fabricate different types of metal masks suitable for pattern transfer into silicon substrates or as templates for metal evaporation to form arrays of nanorings.