This technology introduces a novel method for fabricating multilayer nanophotonic devices using spin-coated planarization layers. The process ensures precise alignment and spacing between optical layers, enabling the creation of advanced optical elements for photonic computing and compound lenses. Spin coating is a procedure used to deposit uniform thin films onto flat substrates. By leveraging spin-coating techniques, the technology simplifies the integration of multiple optical layers, resulting in highly efficient and scalable solutions for nanophotonic systems. Background: Producing multilayer nanophotonic devices requires precise control over the spacing and alignment of optical layers, a challenge that existing fabrication methods struggle to meet. Traditional approaches often involve complex and time-consuming processes that limit scalability and consistency. This invention provides a streamlined solution, combining spin-coating technology with nanophotonic design to enhance the functionality and efficiency of optical components. The spin-coated planarization layers fill gaps and create smooth, well-aligned surfaces between layers while preserving optical properties. Applications:
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