Our researchers are proposing a layered selenization approach to overcome the limitations of other processes. This hybrid approach combines elements of both co-deposition and selenization. Metals are deposited at high rates by sputtering. Selenization is provided in several locations by a large area source that operates in the close space sublimation mode and are separated and shielded from the metal sources. The deposition rate and metal layer thickness are carefully controlled to ensure optimum performance of the process. The scaled-up approach will have multiple units in series so that substrates will be in a continuous conveyor-like motion and will pass over each metal source only once. Cost and performance projections for this CIGS manufacturing technology indicate that it will be significantly superior to all other thin film technologies.
Layered Selenization Approach