Technology Description
Oregon State University is seeking a licensee or industry collaborator for an improved KNN based thin film production process. The newly described methods overcome the difficulties in chemical vapor, sol-gel, sputtering, and pulsed-laser deposition methods because it can be performed cost effectively, in air, using less energy, and with the scalability that standard production methods lack. In addition to these advantages, the thin films produced by this method have superior properties in degree of orientation and surface roughness, allowing the film to be aligned along the polarization direction. These properties are very challenging to attain in the field, and they result in high quality films.
Features & Benefits
Applications
Background of Invention
K(1-x)Na(x)NbO3, or KNN, thin films have multiple current limitations to their use that stem from production constraints. Sputtering and pulsed-laser production require expensive equipment and high energy input. Pulsed-laser and sol-gel deposition have no scalability, and sol-gel has air sensitivity and needs carcinogenic and toxic organic solvents. The use of KNN films is extensive, and may include use in piezoelectrics as sensors and actuators. In addition to the aforementioned physical constraints of these methods of production, some improved properties of the thin films are difficult to attain because crystallographic orientation is not maximized, leading to lower quality thin films.
Status
US patent pending (United States provisional patent application filed)