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Precursor Molecules for Thin-Film Diffusion Barriers that Prevent Electrical Shorts in Integrated Circuits
Improves Diffusion Barriers in Small Integrated CircuitsThese tungsten nitrido precursor molecules are starting materials for low-temperature deposition of tungsten carbonitride (WNCx) thin films that serve as diffusion barriers that prevent electrical shorts in integrated circuits. A common example is prevention of Cu diffusion into other areas within...
Published: 6/27/2021   |   Inventor(s): Lisa McElwee-White, Timothy Anderson, K. McClain, Christopher O'Donohue
Keywords(s): Chemical Vapor Deposition, nitrido complex, precursor, tungsten nitride, tungsten oxide
Category(s): Technology Classifications > Engineering > Chemical, Technology Classifications > Engineering > Materials, Technology Classifications > Others > Cleantech