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Technology for fabricating dense sapphire nanostructures using near‑field focusing of ultrafast lasers
Background Nanostructuring ultrahard materials like sapphire is challenging due to their inherent hardness and chemical stability, which complicate the precise modification and removal of material. Traditional approaches such as multi­layer masking, low-power dry etching, and direct ultrafast laser processing have struggled to achieve the fine,...
Published: 3/26/2025   |   Inventor(s): Chih-Hao Chang, Kun-Chieh Chien, Joshua Cheung
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Category(s): Computer > Semiconductors, Physical sciences > Aerospace, Life sciences > Diagnostic