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Search Results - john+ekerdt
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Surface treatment to shape atomic layer deposition
BackgroundAs device dimensions for integrated circuits continuously scale downwards, significant focus has been devoted to developing alternate processes for the nanofabrication of functional structures. One of the processes being explored is called area-selective atomic layer deposition (AS-ALD). In contrast to conventional lithography techniques,...
Published: 12/8/2023
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Inventor(s):
John Ekerdt
,
Sonali Chopra
Keywords(s):
Category(s):
Physical sciences > Materials
,
Physical sciences > Semiconductor