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Search Results - computer+%3e+ai%2fml
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Rapid optical metrology of critical dimensions of large-area nanostructure arrays with complex patterns
Background Scatterometry-based metrology has the capability to perform high-throughput inspection of geometric characteristics of large-area nanopatterned surfaces. It utilizes physics-based dependencies between reflectance of light scattered from nanopatterned surfaces for pre-defined set of wavelengths and Critical Dimensions (CDs) of such nanopatterns. Current...
Published: 8/16/2024
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Inventor(s):
Dragan Djurdjanovic
,
Ramin Sabbagh
Keywords(s):
Category(s):
Physical sciences > Semiconductor
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Physical sciences > Testing equipment
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Computer > Algorithms and software methods
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Computer > AI/ML